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Our main system products are as follows
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HF-CVD:
Hot-filament chemical vapor deposition, used for polycrystalline
diamond, nanodiamond and carbon nanotube film deposition.
T-CVD:
thermal CVD system for carbon nanotube film deposition and heat
treatment deposition.
PECVD:
plasma enhanced CVD for aligned carbon nanotube, diamond-like
carbon film deposition and plasma treatment.
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Co-sputtering:
Confocal magnetron sputtering system for multi-laysers, alloy
films, metal/oxides/nitride film deposition.
Multi-sputtering:
multiple magnetron sputtering for multi-layers, especially for
magnetic thin film deposition.
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We provide systems with high quality and competitive price |
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detailed information, please contact us. |
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